GICQUEL Alix

Profil

  • LSPM
  • E2
  • A/C1
  • Traitement d’effluents gazeux par des procédés plasma-catalyse
  • Directeur - Professeur
  • C.N.R.S LSPM - UPR 3407
  • 99 Avenue Jean-Baptiste Clément
  • Villetaneuse
  • Ile-de-France
  • France
  • 93430
  • 01-49-40-34-57
  • http://www.labex-seam.fr/profile/gicquel-alix.html
  • P1-D. Rapakoulias, J. Amouroux, M.P. Bergougnan, A. Gicquel ; " Processus catalytiques dans les réacteurs à plasma hors équilibre : III- Décomposition de NH3 " ; Revue de Phys. Appliquée, 17, 95 (1982)
    P2-A. Gicquel, B. Torck ; " Synthesis of methyl tertiary butyl ether catalyzed by ion exchange resin
    Influence of methanol concentration and temperature " J. of Catalysis, Vol. 83, n° 1, 9-18 (1983)
    P3- M.P. Bergougnan, A. Gicquel, J. Amouroux, " Modification des processus hors équilibre au cours de l'interaction entre un plasma basse pression et une surface " ; I- Cas d'un plasma NH3 - Application à la catalyse chimique ; Revue Phys. Appl., 18, p 335-346 (1983)
    *P4- J. Amouroux, M.P. Bergougnan, A. Gicquel ; " Les Mécanismes Chimiques de l'Interaction Plasma Hors Equilibre-Surface " ; Annales de Chimie, 8, p 319-333 (1983)
    P5- J. Amouroux, D. Morvan, A. Gicquel, " Plasma for Special applications " ; Fresnius Zeitschrift für analytische Chemie Vol 324, 384-396 (1985)
    P6- J. Amouroux, A. Gicquel, S. Cavvadias, D. Morvan, F. Arefi, " Progress in the Application of Plasma Surface Modification and Correlation with the Chemical Properties of the Plasma Phase " ; International Union on Physics and Applied Chemistry IUPAC, Pure and Applied Chemistry, Vol. 57, n° 9, p 1207-1222 (1985)
    P7- A. Gicquel, S. Cavvadias, J. Amouroux ; " Heterogeneous Catalysis in Low Pressure Plasma "
    J. of Physics D, Applied Physics, 19, 2013-2042 (1986)
    P8- J.L. Brisset, J. Amouroux, A. Doubla, A. Gicquel, A. Goldman, F. Rouzbehi
    " Plasma-solid interaction-acid-base reactivity at the interface " ; Scanning Electron Microscopy ,Vol. 1, N°4, 1575-1592 (1987)
    *P9- A. Gicquel, P. Saillard, N. Laidani, J. Amouroux ; " Mécanisme de décomposition catalytique dans un plasma d'ammoniac basse pression. Etude cinétique en présence d'argon comme actinomètre " ; Rev. de Phys. Appl. , 24, 285-294 (1989)
    P10- N. Laidani, J. Perrière, D. Lincot, A. Gicquel, J. Amouroux ; " Nitriding of bulk titanium and thin titanium films in a NH3 low pressure plasma " Appl. Surface Science 36, 520-529 (1989)
    P11- A. Gicquel, N. Laidani, P. Saillard, J. Amouroux ; " Plasma and Nitrides : Application to the Nitriding of Titanium " ; Pure and Applied Chemistry , vol 62, n° 9, 1743-1750 (1990)
    P12- P. Saillard, A. Gicquel, J. Amouroux, N. Moncoffre, J. Tousset ; " Role of Oxygen contamination on Titanium Nitriding " Surface and Interface Analysis, Vol 16, 530-534 (1990)
    P13- P. Saillard, A. Gicquel, J. Amouroux ; " Plasma Process for Thermodiffusinal Titanium Nitriding ", Surface and Coating Technology, 45, 201- 207 (1991)
    P14- A. Gicquel, Y. Catherine ; " Plasmas: Sources of Excited, Ionized, Dissociated Species. Consequences for Chemical Vapor Deposition (CVD) and for Surface Treatment "
    Journal de Physique IV, C2-343-356, C2, suppl. Journal de Physique II, sept 1991
    P15- A. Gicquel, C. Héau, D. Fabre, J. Perrière ; " Processes and Parameters for the Deposition for Diamond Deposition " ; Diamond and Related Materials I 776-781 (1992)
    P16- A. Gicquel, E. Anger, M. F. Ravet, D. Fabre, G. Scatena, Z.Z. Wang ; " Diamond deposition in a bell jar reactor : Influence of the plasma and substrate parameters on the microstructure and the growth rate " ;
    Diamond and Related Materials, 2, 417-424 (1993)
    P17-M. F. Ravet, A. Gicquel, E. Anger, Z. Z. Wang, Y. Chen, F. Rousseaux ; " Realization of X-ray Lithography Masks based on Diamond Membranes " ; Mat. Res. Symp. Proc. Vol 306, p. 103-9,(1993)
    P18- A. Gicquel, K. Hassouni, S. Farhat, Y. Breton, C. D. Scott, M. Lefevbre, M. Pealat ; " Spectroscopic Analysis and Chemical Kinetics Modeling of a Diamond Deposition Plasma Reactor " ; Diamond and Related Materials , vol 3, n° 4-6, 581-586 (1994)
    P19- R. D'Agostino, R. Lamendola, P. Favia, A. Gicquel ; " Fluorinated diamond-like carbon films deposited from RF glow discharge in a triode reactor ", Journal of Vacuum Science and Technology, A 12 (2) 308-313 (1994)
    P20- K. Plamman, D. Fournier, E. Anger, A. Gicquel ; " Photothermal Examination of the Heat Diffusion inhomogeneity in Diamond films of submicron thickness " ; Diamond and Related Materials , vol 3, n° 4-6, 752-756 (1994)
    P21- C. Vivensang, G. Turban, E. Anger, A. Gicquel ; " Reactive ion etching of diamond and diamond like carbon films " ; Diamond and Related Materials vol 3, n° 4-6, 645-649 (1994)
    P22- M. Capitelli, G. Colonna, K. Hassouni, A. Gicquel ; " Electron Energy Distribution Function in Non Equilibrium H2 Discharges: the role of Superelastic Collisions from Electronically Excited States " ;
    Chem. Phys. Letter 228, 687-694 (1994)
    P23- C. F. Borges, M. Moisan, A. Gicquel ; " A Novel Technique for Diamond Film Deposition using Surface Wave Discharges " ; Diamond and Related Materials, n° 4, 149- 154 (1995)
    P24- C. Findeling, A. Vignes, A. Gicquel, R. Chiron ; "MPACVD Homoepitaxial Growth : role of the Plasmas Parameters and the Substrate Temperature " Diamond and Related Material 4, 429-434 (1995)
    P25- E. Anger, A. Gicquel, Z. Z. Wang, M. F. Ravet ; " Chemical and Morphological Study of Silicon Substrates treated by Ultrasonic Impact of Powders: Consequences on Diamond Nucleation " Diamond and Related Material, 4, 759-764 (1995)
    P26- C. F. M. Borges, L. St-Onge, M. Moisan, A. Gicquel, " Influence of process parameters on diamond film CVD in a surface-wave driven microwave plasma reactor " ; Thin Solid Films, 274, 3-17 (1995)
    P27- M. Capitelli, G. Colonna, K. Hassouni, A. Gicquel ; "Electron Energy Distribution functions and rate and transport coefficients of H2/H/CH4 reactive plasmas for diamond film deposition " ; Plasma Chemistry and Plasma Processing vol 16, n° 2, 153-185 (1996)
    P28-A. Gicquel, K. Hassouni, Y. Breton, M. Chenevier, J. C. Cubertafon ; " Gas Temperature Measurements by laser spectroscopic techniques and by optical emission spectroscopy " ; Diamond and Related Materials Vol 5, (1996), pp 366-372
    P29- F. Silva, A. Gicquel, A. Tardieu, P. Clédat ; " Control of a MPACVD Reactor for polycristalline textured diamond films synthesis: role of the microwave power density " ; Diamond and Related Materials Vol 5, (1996) pp 338-344
    P30- S. Illias, G. Séné, P. Moller, V. Stambouli, J. Pascallon, D. Bouchier, A. Gicquel, A. Tardieu, E. Anger, M. F. Ravet, ; " Planarization of diamond thin film surfaces ion beam etching at grazing incidence angle " ; Diamond and Related Materials , vol 5, (1996) pp 835-839
    P31- C. Vivensang, L. Ferlazzo-Manin, M. F. Ravet, F. Rousseaux, G. Turban, A. Gicquel ; " Surface soothing of Diamond Membranes by reactive ion etching processes " ; Diamond and Related Materials , vol 5, (1996) pp 840-844
    P32- C. Jany, F. Foulon, P. Bergonzo, A. Brambilla, F. Silva, A. Gicquel, T. Pochet ; " Influence of CVD diamond film crystalline structures on the electrical properties of CVD Diamond " ; Diamond and Related Materials , vol5, (1996) pp 741-746
    P33- F. Foulon, P. Bergonzo, C. Jany, A. Gicquel, T. Pochet ; " CVD diamond photoconductors for picosecond radiation pulse characterization " ; Diamond and Related Materials, vol 5, (1996) pp 732-736
    P34- C. D. Scott, S. Farhat, A. Gicquel, K. Hassouni, M. Lefevbre ; " Finding Electron Temperature and Density in a Hydrogen Microwave Discharge Plasma " ; ThermoPhysics and Heat Transfer , vol 10 (1996), pp 426-435
    P35- A. Gicquel, M. Chenevier, Y. Breton, M. Petiau, J. P. Booth, K. Hassouni ; " Ground state and excited H-atom temperatures in a microwave diamond deposition reactor " ; Journal de Physique III, vol 6, (1996), pp 1167-1180
    P36- K. Hassouni, S. Farhat, C. D. Scott, A. Gicquel ; " Modeling of species and energy transport in moderate pressure H2 plasmas obtained under diamond deposition discharge conditions " ; Journal de Physique III , vol 6, (1996) pp 1229-1243
    P37- Ch. Chardonnet, V. Bernard, Ch. Daussy, A. Gicquel, E. Anger ; " Polarization properties of thin films of diamond " ; Applied Optics Vol 35, n° 34, 6692-97 (1996)
    P38- M. Capitelli, G. Colonna, A. Gicquel, C. Gorse, K. Hassouni, S. Longo, " Maxwell and Non-Maxwell behaviour of electron energy distribution function under expanding plasma jet conditions : the role of electron-electron, electron-ion, and superelastic electronic collisions under stationary and time-dependent conditions " ; Physical Review E, 54 (1996) pp 1843.
    P39- N. Cella, H. EL Rhaled, J. P. Roger, D. Fournier, E. Anger, A. Gicquel ; " Ex-situ Spectroscopy Ellipsometry Studies micron-thick CVD diamond films " ; Diamond and Related Materials 5 (1996) 1424-1432
    P40- K. Hassouni, M. Capitelli, S. Farhat, C. D. Scott, A. Gicquel ; " Effect of the EEDF Non Maxwellian behaviour on species and energy transport in moderate pressure H2 plasmas " ; Surface Coating and Technology vol 97, n°1, p 495-506 (1997)
    P41- C. Findeling-Dufour, A. Gicquel, "Study of a Multi-Step process for realizing a large area single-crystal of diamond " ; Thin Solid Film, 308-309, pp 178-185 (1997)
    P42- Torrealba-Anzola-F, Chambaudet-A, Theobald-J-G , Jouffroy-M; Jany-C, Foulon-F Bergonzo-Ph; Gicquel-A; Tardieu-A, " High frequency photoconductivity of CVD diamond films ", Diamond-and-Related-Materials. vol.7, no.9; Sept. 1998; p.1338-41.
    P43- Foulon-F; Bergonzo-P; Borel-C; Marshall-RD; Jany-C; Besombes-L; Brambilla-A; Riedel-D; Museur-L; Castex-MC; Gicquel-A, " Solar blind chemically vapor deposited diamond detectors for vacuum ultraviolet pulsed light-source characterization , Journal-of-Applied-Physics. vol.84, no.9; 1 Nov. 1998; p.5331-6.
    P44- A. Gicquel, M. Chenevier, K. Hassouni, A. Tserepi, and M. Dubus ; " On validation of actinometry for estimating relative H-atom densities and electron energy evolution in plasma enhanced diamond deposition reactors " ; Journal of Applied Physics; Vol. 83; n°. 12; 7504 1998.
    P45- K. Hassouni, O. Leroy, S. Farhat et A. Gicquel, ‘Modeling of H2 and H2/CH4 moderate pressure microwave plasma used for diamond deposition’, Plasma Chemistry and Plasma Processing, 18 (3), pp. 325-361, 1998.
    P46- S. DeClos, D. Dorignac, F. Philipp, F. Silva, A. Gicquel ; " Ultra-high resolution electron microscopy of defects in the CVD diamond structure " ; Diamond and Related Materials, , 7, 2-5, 222-227 (1998)
    P47- C. Findeling-Dufour, A. Gicquel, R. Chiron ; " Growth of large single-crystal diamond layers : analysis of the junctions between adjacent diamonds ", Diamond and Related Materials (12 pages) , 7, 7 986 -; 998 (1998)
    P48- K. Hassouni , A. Gicquel, M. Capitelli, " The role of dissociative attachement from Ridberg states in Enhancing H- concentration in Moderate and low pressure H2 plasma sources " ; Chemical Physics Letters vol 290, pp 502, 1998
    P49- S. Farhat, C. Findeling, F. Silva, K. Hassouni and A. Gicquel, 'Role of the plasma composition at the surface on diamond growth', Journal de Physique IV, 8, pp. 391-400, 1998
    P50- J. Pascallon, V. Stambouli, S. Ilias, D. Bouchier, G. Nouet, F. Silva, A. Gicquel,
    Microstructure of c-BN thin films depositted on diamond films,’,
    Diamond and related Mater. 8, 2-5, 325-330 (1999)
    P51- J. Pascallon, V. Stambouli, S. Ilias, D. Bouchier, G. Nouet, F. Silva, A. Gicquel,
    Deposition of c-BN films on diamond : influence of the diamond roughness
    Materials Science and Engineering B 59, 1-3, 293-243 (1999).
    P52- K. Hassouni, T. A. Grotjohn, and A. Gicquel, 'Self-Consistent Microwave Field and Plasma Discharge Simulations for a Moderate Pressure Hydrogen Discharge Reactor',
    Journal of Applied Physics, 86, 1, 134 -; 151 (1999)
    P53- K. Hassouni, A. Gicquel, M. Capitelli,
    Self consistent relaxation of the electron energy distribution function in excited H2 post discharge
    Physical Review E, 59, 3, 3741 -; 3744 (1999)
    P54- K. Hassouni, A. Gicquel, M. Capitelli and J. Loureiro,
    'Chemical kinetics and energy transfer in moderate pressure H2 plasmas obtained under diamond deposition discharge conditions',
    Plasma Sources Sciences and Technology 8, 3, 494 - 512 (1999)
    P55- X. Duten, A. Rousseau, A. Gicquel, P. Leprince
    " Rotational Temperature measurements of excited and ground state of C2(d3g-a3u) transition in a H2/CH4 915 MHz microwave pulsed plasma.
    J. Appl. Phys., 86, 9, 5299 -; 5301 (1999)
    P56- C. Jany, A. Tardieu, A. Gicquel, P. Bergonzo, F. Foulon,
    " Influence of the growth parameters on the electrical properties of thin polycrystalline CVD diamond films ", Diamond and Related Materials, 2000, 9, 3-6, 1086 -; 1090
    P57- M. A. Cappelli, T.G. Owano, A. Gicquel, and X. Duten
    -Methyl Concentration Measurements during Microwave Plasma-Assisted Diamond Deposition-, Plasma Chemistry and Plasma Processing, 2000, 20, 1, 1-12
    P58- S. Declos, D. Dorignac, F. Philipp, F. Silva, A. Gicquel,
    " UHREM investigation of growth defects in CVD diamond films : twin interactions and five-fold twin centers-
    Diamond and Related Materials 9, 346 -; 350 (2000)
    P59- A. Gicquel, K. Hassouni, F. Silva, " CVD diamond growth under various environments ",
    J. Electrochemical Society 147/6 2218 -; 2226 (2000)
    P60 - F. Silva, A. Gicquel , A. Chiron, J. Achard
    " Low roughness diamond films produced at temperatures less than 600 °C "
    Diamond and Related, 2000, 9, 1965 -; 1970.
    P61- A. Gicquel, K. Hassouni, F. Silva, J. Achard,
    " CVD Diamond : from growth to applications " (article de revue)
    Current Applied Physics vol 1, 479-496, 2001
    P62- M. H. Gordon, X. Duten, K. Hassouni, A. Gicquel
    Energy coupling efficiency of a hydrogen microwave plasma reactor
    J. Appl. Phys. 89 (3), 494 (2001)
    P63-K. Hassouni, X. Duten, A. Rousseau, A. Gicquel
    Investigation of chemical kinetics and energy transfer in a pulsed microwave H2/CH4 plasma.
    Plasma Sources Sciences Technolo., vol 10, n°1, 61-75, 2001
    P64-Hayachi, K. Yokota Y., Tachibana T., Kobashi K, Achard J., Gicquel A.., Oliver, Castex M.C.
    Temporal response of UV sensors made of highly diamond films by 193 nm and 308 nm laser pulse
    Diamond and Related Materials, 2001 vol 10, n°9-10, 1794-98
    P65-P A. Delahaye, I. Pentchev, A. Aoufi, A. Gicquel
    Improvement of the hydrogen storage by adsorption using 2 D Modeling of Heat Effects.
    AICHE Journal, 2002, 48, 9, 2061-2073
    P66-J. Achard, A. Tardieu, A. Kanaev, A. Gicquel, M. C. Castex, K. Hayachi, Y. Yokota, T. Tachibana T., K. Kobashi,
    Photoconductivity of highly oriented and randomly oriented diamond films for the detection of fast UV laser pulses
    Diamond and Related Materials, 2002 vol 11 n° 3-6 423- 426
    P67-X. Duten, A. Rousseau, A. Gicquel, K. Hassouni, Ph. Leprince
    Time resolved measurement of the gas temperature in H2/CH4 medium pressure microwave 915 MHz pulsed plasma
    J. Phys. D: Appl. Phys 35 (2002) 1939-1945
    P68- K. Hassouni, T. Grotjohn, A. Gicquel
    Different discharges regimes in microwave cavity coupling systems used for generation of moderated pressure H2 and H2/CH4 plasma
    IEEE Transaction on Plasma Sciences 2002, 30, 1, Part 1, 172-173
    P69- D. Levesque, A. Gicquel, F. Lamari-Darkrim, S. Beyaz Kayran
    Monte Carlo Simulation of hydrogen storage in carbon nanotubes
    Inst. Of Physics Publishing, J. Phys. : Condensed Matter 14 (2002) 9285-9293
    P70- A. Gicquel, K. Hassouni, G. Lombardi, X. Duten, A. Rousseau
    New driving parameters for diamond deposition reactors : pulsed mode versus continuous mode
    Materials Research, ISSN 1516-1439 (vol 6, n° 1, 25- 37, 2003)
    P71- F. Silva, R. S. Sussmann, F. Benedic, A. Gicquel
    " Reactive ion etching of diamond using microwave assisted plasmas "
    Diamond and Related Materials, 12 (2003) 369-373.
    P72- G Lombardi, K Hassouni, X. Duten, A Rousseau, A Gicquel,
    " On the interest of using pulsed plasmas for diamond growth "
    Journal of Electrochemical Society, 150 (5) 2003, 311
    P73- G Lombardi, G D Stancu, F Hempel, A. Gicquel and J Röpcke
    On Quantitative Detection of Methyl Radicals in Non-Equilibrium Plasmas
    Plasma Sources Sciences Technology 12 (2003) 1-12
    P74- F. Benedic, M. B. Assouar, F. Mouasseb, O. Elmazria, P. Alnot, A. Gicquel
    Surface acoustic wave devices based on nanocristalline diamond and aluminium nitride
    Diamond and Related Materials, 13 (2004) 347
    P75- J. Achard, F. Silva, H. Schneider, R. Sussmann, A. Tallaire, A. Gicquel, M.C. Castex
    The use of CVD diamond for high-power switching using electron beam excitation
    Diam. Relat. Mater., 13, 876-880, (2004)
    P76- A. Tallaire, J. Achard, F. Silva, R. S. Sussmann, A. Gicquel, E. Rzepka,
    Oxygen plasma pre-treatment for high quality homoepitaxial CVD diamond deposition,
    Physica Status Solidi (A) Applications and Materials, 201, 2419-2424 (2004)
    P77- G. Lombardi, F. Mouasseb, F. Benedic, K. Hassouni, A. Gicquel
    Determination of gas temperature and C2 concentration in Ar/H2/CH4 microwave discharges used for nanocristalline diamond deposition from C2 Mulliken system
    Plasma Sources Sci. Technol., 13 (3), 375-386 (2004).
    P78- G. Lombardi, G.D. Stancu, F. Hempel, A. Gicquel, J. Röpcke,
    The quantitative detection of methyl radicals in non-equilibrium plasmas : a comparative study
    Plasma Sources Sci. Technol. 13 (1), 27-38 (2004).
    P79- G. Lombardi, K. Hassouni, F. Bénédic, F. Mohasseb, J. Röpcke, A. Gicquel :
    Optical diagnostic and modeling study of an Ar/H2/CH4 microwave discharge used for nanocrystalline diamond films deposition
    J. Applie Physics, 96 (11), 6739-6751 (2004).
    P80- G. Lombardi, X. Duten, K. Hassouni, M. Capitelli, A. Gicquel
    On the coupling of electron energy distribution function and excited states distribution in pulsed H2 microwave plasmas
    Eur. Phys. J. D, 30 (2), 225-233 (2004).
    P81- G. Hagelaar, K. Hassouni, A. Gicquel
    Interaction between the electro-magnetic fields and the plasma in a microwave plasma reactor
    Journal of Applied Physics vol96,n°4, 1819-1828 (2004)
    P82- B. Weinberger, D. Darkrim-Lamari, S. Beyaz-Kayiran, A. Gicquel
    Molecular modeling of H2 purification on Na-LSX zeolithe and experimental validation
    AiCHE Journal, Vol 51, N°1, 142-148 (2004)
    P83- J. Achard, F. Silva, H. Schneider, R. S. Sussmann, A. Tallaire, A. Gicquel, M.C. Castex,
    " The use of CVD diamond for high-power switching using electron beam exitation ",
    Diamond and Related Material, vol. 13, pp 876-880, (2004)
    P84- V.A. Shakhatov, O. de Pascale, M. Capitelli, K. Hassouni, G. Lombardi, A. Gicquel
    Measurement of vibrational, gas, and rotational temperature of H2(X1g+) in radio frequency inductive discharge by multiplex coherent anti-Stokes Raman scattering spectroscopy technique
    Phys. Plasma, 12 (2), paper 023504, DOI 10.1063/1.1829065 (2005).
    P85- F. Silva, F. Benedic, P. Bruno, A. Gicquel
    -Formation of 110 texture during nano-crystalline diamond growth: an X-ray diffraction study-
    Diamond and Related Materials, Volume: 14 Issue: 3-7 pp: 398-403 (2005)
    P86- J. Achard, A. Tallaire, R.S. Sussmann, F.Silva, A. Gicquel,
    " The control of growth rate in the synthesis of high quality single crystalline diamond by CVD ",
    Journal of crystal growth, 284, pp. 396-405 (2005)
    P87- A. Tallaire, J. Achard, F. Silva, A. Gicquel,
    " Effect of increasing the plasma density in both continuous and pulsed wave mode on the growth of monocrystalline diamond films",
    Physica Status Solidi (A) Applications and Materials, 202, pp. 2059-2065 (2005)
    P88- A. Tallaire, J. Achard, F. Silva, R. S. Sussmann, A. Gicquel,
    " Homoepitaxial deposition of high-quality thick diamond films: effect of growth parameters
    Diamond and Related Material, vol. 14, pp 249-254 (2005)
    P89- W. Wang, A. Tallaire, M.S. Hall, T.M. Moses, J. Achard, R.S. Sussmann, A. Gicquel,
    " Experimental CVD synthetic Diamonds from LIMHP-CNRS, France ",
    Gems & Gemology, vol. 41, pp. 234-244 (2005)
    P90 - M. Amaral, F. Mohasseb, F. J. Oliveira, F. Benedic, R. F. Silva, A. Gicquel,
    -Nanocrystalline diamond coating of silicon nitride ceramics by microwave plasma assisted CVD-, Thin Solid Films, 482 (2005) 233-237.
    P91- K. Hassouni, G. Lombardi, and A. Gicquel, M. Capitelli, V. A. Shakhatov, O. De Pascale,
    -Non equilibrium vibrational excitation of H2 in radiofrequency discharges: A theoretical approach based on coherent anti-Stokes Raman spectroscopy measurements-,
    Phys. Plasma, 12 (2), paper 073301, (2005).
    P92- G Lombardi, K Hassouni,4, G D Stancu, L Mechold, J Röpcke and A Gicquel,
    -Study of an H2/CH4 moderate pressure microwave plasma used for diamond deposition: modelling and IR tuneable diode laser diagnostic-,
    Plasma Sources Sci. Technol. 14 440-450 (2005)
    P93- G. Lombardi and K. Hassouni, G.-D. Stancu, L. Mechold, J. Röpcke, A. Gicquel ,
    -Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition-,
    J. Applied Physics 98, 053303 (2005)
    P94- G. D. Stancu1, A. V. Pipal, G. Lombardi, P. B. Davies, A. Gicquel, B. P. Lavrov, J. Röpcke,
    -On the Reaction Kinetics of Chemically Active Molecular Microwave Plasmas-,
    Contrib. Plasma Phys. 45, No. 5-6, 358 -; 368 (2005) / DOI 10.1002/ctpp.200510041
    P95- M. Capitelli, M. Cacciatore, R. Celiberto, O. De Pascal, P. Diomede, F. Esposito, A. Gicquel, C. Gorce, K. Hassouni, A. Larichiuta, S. Longo, D. Pagano, S. Rutigliano; Vibrational kinetics, electron dynamics and elementary processes in H2 and D2 plasmas for negative ion production: modelling aspects; nuclear fusion vol 46, Is 6, pagesS260-S274 DOI 10.1088/0029-5515/46/6/506 (2006)
    P96- Rayar M, Veis P, Foissac C, Supiot P, Gicquel A; Gas temperature determination using BH(0-0)i-X-1+ emission spectrum in a B2H6 containing plasma for doped diamond deposition, J. Phys D- Appl Phys. 39, 10, pp2151-2159 (2006)
    P97- F. Silva, J. Achard, X. Bonnin, A. Michaud, A. Tallaire, O. Brinza, A. Gicquel,
    " 3D crystal growth model to understand the role of plasma pre-treatment on CVD diamond crystal shape ",
    Physica Status Solidi (A) Applications and Materials, 203, pp. 3049-3055 (2006)
    P98- A. Tallaire, J. Achard, A. Secroun, O. De Gryse, F. De Weerdt, J. Barjon, F. Silva, A. Gicquel,
    " Multiple growth and characterization of thick diamond single crystals using chemical vapour deposition working in pulsed mode ",
    Journal of crystal growth, 291, pp. 533-539 (2006)
    P99- A. Tallaire, A.T. Collins, D. Charles, J. Achard, R. Sussmann, A. Gicquel, M. E. Newton, A. M. Edmonds, R. J. Cruddace,
    " Characterisation of high-quality thick single-crystal diamond grown by CVD with a low nitrogen addition ",
    Diamond and Related Material, 15, pp. 1700-1707 (2006)
    P100- K. Hassouni, F. Mohasseb, F. Benedic, G. Lombardi, A. GIcquel,
    -Formation of soot particles in Ar/H2/CH4 microwave discharges during nanocrystalline diamond deposition: a modelling approach-,
    Pure and Applied Chemistry, 78 (2006) 1127-1145.
    P101- K Hassouni, G Lombardi, X Duten, G Haagelar, F Silva, A Gicquel, T A Grotjohn, M Capitelli and J Röpcke,
    -Overview of the different aspects in modelling moderate pressure H2 and H2/CH4 microwave discharges-, Plasma Sources Sci. Technol. 15 (2006) 117-;125
    P102- P. Djemia, A. Tallaire, J. Achard, F. Silva, A. Gicquel, " Elastic properties of single crystal diamond made by CVD",
    Diamond and Related Material, 16, pp. 962-965 (2007)
    P103- J. Achard, F. Silva, O. Brinza, A. Tallaire, A. Gicquel, " Coupled effect of nitrogen addition and surface temperature on the morphology and the kinetics of thick CVD diamond single crystals ", Diamond and Related Material, 16, pp. 685-689 (2007)
    P104- D. Monéger, F. Bénédic, R. Azouani, F. Chelibane, O. Syll, F. Silva, A. Gicquel,
    -Deposition of nanocrystalline diamond films in pulsed Ar/H2/CH4 microwave discharges-,
    Diamond and Related Materials, 16, pp. 1295-1299 (2007).
    P105- A. Secroun, A. Tallaire, J. Achard, G. Civrac, H. Schneider, A. Gicquel,
    " Photoconductive Properties of Lightly N-Doped Single Crystal CVD Diamond Films : application to high power photoswitches ",
    Diamond and Related Material, 16, pp. 953-957 (2007)
    P106- O. Brinza, J. Achard, F. Silva, X. Duten, A. Michau, K. Hassouni, A. Gicquel,
    " Improvement of energetic efficiency of homoepitaxial diamond growth by the use of H2-CH4 pulsed discharge-
    Physica Status Solidi (A) Applications and Materials, 204, No. 9, 2847-;2853 (2007)
    P107- A. Secroun, O. Brinza, A. Tardieu, J. Achard, F. Silva, K. De Corte, H. Anthonis, M. Newton, J. Riestein, A. Gicquel,
    " Birefringence imaging for electronics application crystal selection ",
    Physica Status Solidi (A) Applications and Materials, 204 (12), pp. 4298-4304 (2007)
    P108- J. Achard, F. Silva, A. Tallaire, X. Bonnin, G. Lombardi, K. Hassouni, A. Gicquel,
    " High quality MPACVD diamond single crystal growth : high microwave power density regime ",
    J. Phys. D: Appl. Phys. 40 (2007) 6175-;6188
    P109- D. Moneger, F. Benedic, F. Sarry, P. REnard, R. Azouni, O. Elmazria, F. Silva, A. Gicquel,
    -Versatile properties of nanocrystalline diamond films deposited in Ar/H2/CH4 microwave discharges as a function of process parameters-,
    Physica Status Solidi (A) Applications and Materials 204, No. 9, 2868-;2873 (2007)
    P110- D. Monéger, F. Benedic, R. Azouani, F. Chelibane, O. Syll, F. Silva, A. Gicquel,
    -Deposition of nanocrystalline diamond films in pulsed Ar/H2/CH4 microwave discharges-
    Diamond and Related Materials, 16 (2007) 1295-;1299
    P111- F. Silva, A. Michau, X. Bonnin, A. Gicquel, N. Boutroy b, N. Chomel, L. Desoutter, Electromagnetic modelling of a microwave cavity used for the deposit of amorphous carbon films on the inner wall of PET bottles,
    Diamond & Related Materials 16 (2007) 1278-;1281
    P112- F. Silva, X. Bonnin, J. Achard, O. Brinza, A. Michau, A. Gicquel
    Geometric modeling of homoepitaxial CVD diamond growth: I The {1 0 0}{1 1 1}{1 1 0}{1 1 3} system
    J. of Crystal Growth 310 (2008) 187-;203
    P113-Rayar M, Supiot P, Veis P, Gicquel A.,
    Optical emission study of a doped diamond deposition process by plasma enhanced chemical vapor deposition,
    Journ Appl. Phys, Vol 104 (3) (2008)
    P114-O. Brinza, J. Achard, F. Silva, X. Bonnin, P. Barroy, K. De Corte, and A. Gicquel
    Dependence of CVD diamond growth rate on substrate orientation as a function of process parameters in the high microwave power density regime
    Physica Status Solidi (A) Applications and Materials, 205, No. 9, 2114-;2120 (2008)
    P115- F. Benedic, M. B. Assouar, P. Kirsch, D. Monéger, O. Brinza, O. Elmezaria, P. Alnot, A. Gicquel,
    Very high frequency SAW devices based on nanocrystalline diamond and aluminum nitride layered structure achieved using e-beam lithography,
    Diamond and Related Material, 17, 4-5, 804-808, (2008)
    P116- F. Benedic, X. Duten, O. Syll, G. Lombardi, K. Hassouni, A. Gicquel,
    Spectroscopic diagnostics of pulsed microwave plasmas used for nanocrystalline diamond growth, Chemical Vapor deposition, vol 14, 7-8, pp 173-180 (2008)
    P117- Silva F, Achard J, Bonnin X, Brinza O., Michau A., Secroun A., De Corte K., Felton S., Newton M., Gicquel A;
    Single crystal CVD diamond growth strategy by the use of a 3 D geometrical model : growth on (113) oriented substrates ,
    Diamond & Related Materials Vol. 17, 7-10, 1067-1075 (2008)
    P118- P.N. Volpe, P. Muret, F. Omnès, J. Achard, F. Silva, O. Brinza, A. Gicquel,
    Defect analysis and excitons diffusion in undoped homoepitaxial diamond films after polishing and oxygen plasma etching
    Diamond & Related Materials, 18, 1205 (2009).
    P119- Achard J, Silva F, Brinza O, Bonnin X., Issaoui R., Kasu M., Gicquel A,
    Identification of etch-pit crystallographic faces induced on diamond surface by H2/O2 etching plasma treatment,
    Physica Status Solidi (A) Applications and Materials, 206 , 9, 1949-1954 (2009)
    P120- Silva F, Hassouni K, Bonnin X, Gicquel A;
    Microwave engineering of plasma assisted CVD reactors for diamond deposition,
    J. of phys. condensed matter, vol 21, 36, n° 364202 (2009)
    P121- M. Belhaj, T. Tondu, V. Inguimbert, P. Barroy, F. Silva, A. Gicquel;
    Effects of incident electron current density and temperature on the total electron emission yield of polycristalline CVD diamond ;
    J. Phys. D: Appl. Phys (2010)
    P122- K. Hassouni, F. Silva, A. Gicquel,
    Modelling od diamond deposition microwave cavity generated plasmas,
    J. Phys. D: Appl. Phys 42, (2010)
    P123- S. Kone, G. Civrac, H. Schneider, K. Isoird,R. Issaoui, J. Achard, A. Gicquel,
    CVD diamond Schottky barrier diode, carrying out and characterization,
    Diamond & Related Materials, vol 19, issue 7-9, pp 792-795 (2010)
    P124- Almeida FA, Derkaoui N, Oliveira FJ, F. Benedic, Silva, R. F, Gicquel,
    Erosive wear resistance of NCD coatings produced by pulsed microwave discharges, Diamond & Related Materials, Vol 19, pp. 484-488 (2010).
    P125- Issaoui, R, Achard, J, Silva, F, Tallaire, A Tardieu, A, Gicquel, A., Pinault, M. A., Jomard, F. , Growth of thick heavily boron-doped diamond single crystals: Effect of microwave power density, , Appl. Phys. Let., Vol; 97, Issue: 18, (2010)
    P126- J. Achard, F. Silva, R. Issaoui, O. Brinza, A. Tallaire, H. Schneider, K. Isoird, H. Ding, S. Kone, M. A. Pinault, F. Jomard, A. Gicquel, Thick boron doped diamond single crystals for high power electronics, Diam & Relat. Mater. Vol 20, Iss. 2 pp 145-152 (2011)
    P127- A. Tallaire, C. Rond, F. Bénédic, O. Brinza, J. Achard, F. Silva, A. Gicquel,
    "Effect of argon addition on the growth of thick single crystal diamond by high-power plasma CVD", Physica Status Solidi (A) Applications and Materials (accepté 2011)
    P128- R. Issaoui, J. Achard, F. Silva, A. Tallaire, V. Mille, A. Gicquel, -Influence of oxygen addition on the crystal shape of CVD boron doped diamond-,
    Physica Status Solidi a-Applications and Materials Science 208, pp. 2023-2027 (2011).
    P129- P. Kumar, A. Ahmad, C. Pardanaud, M. Carrère, J. M. Layet, G. Cartry, F. Silva, A. Gicquel, R. Engeln," Enhanced negative ion yields on diamond surfaces at elevated temperatures ", Journal of Physics D: Applied Physics 44, p. 372002 (2011).
    P130- A.Tallaire, J. Barjon, O. Brinza, J. Achard, F. Silva, V. Mille, R. Issaoui, A. Tardieu, A. Gicquel, " Dislocations and impurities introduced from etch-pits at the epitaxial growth resumption of diamond ", Diamond and Related Materials 20, pp. 875-881 (2011).
    P131- - A. Gicquel, N. Derkaoui, C. Rond, B. Benedic, G. Cicala, D. Moneger, K. Hassouni, -Quantitative analysis of diamond deposition reactor efficiency- Chemical Physics Vol 398, Pages 239-;247 (2012)
    P132- R. Issaoui, J. Achard, A. Tallaire, F. Silva, A. Gicquel et al., -Evaluation of freestanding boron-doped diamond grown by chemical vapour deposition as substrates for vertical power electronic devices-, Appl. Phys. Lett. 100, 122109 (2012); doi: 10.1063/1.3697568
    P133- J. Achard, R. Issaoui, A. Tallaire, F. Silva, J. Barjon, F. Jomard, A. Gicquel, F Freestanding CVD boron doped diamond single crystals: A substrate for vertical power electronic devices? PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE Volume: 209 Issue: 9 SpecialIssue: SI Pages: 1651/1658 DOI: 10.1002/pssa.201200045 Published: SEP 2012
    P134- M. Naamoun, A. Tallaire, F. Silva, J. Achard, P. Doppelt, A. Gicquel, Etch-pit formation mechanism induced on HPHT and CVD diamond single crystals by H2/O2 plasma etching treatment; PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE Volume: 209 Issue: 9 Special/Issue: SI Pages: 1715/1720 DOI: 10.1002/pssa.201200069 Published: SEP 2012
    P135- A. Tallaire, J. Achard, F. Silva, O. Brinza, A. Gicquel, Growth of large size diamond single crystals by plasma assisted chemical vapour deposition: Recent achievements and remaining challenges, COMPTES RENDUS PHYSIQUE Volume: 14 Issue: 2-3 Pages: 169-184 DOI: 10.1016/j.crhy.2012.10.008 Published: FEB-MAR 2013
    P136- A. Tallaire, J. Achard, O. Brinza, V. Mille, M. Naamoun, F. Silva, A. Gicquel,
    Growth strategy for controlling dislocation densities and crystal morphologies of single crystal diamond by using pyramidal-shape substrates; DIAMOND AND RELATED MATERIALS Volume: 33 Pages: 71/77 DOI: 10.1016/j.diamond.2013.01.006 Published:MAR 2013





    3 Brevets
    - J.P. Briand, N. Béchu, A. Gicquel, J. Achard ;
    Brevet " Procédé de traitement d'une surface de diamant et surface de diamant correspondante " 09 Feb 2000, n° 0001604
    - A. Gicquel, F. Silva, X. Duten, K. Hassouni, G. Lombardi, .A. Rousseau
    " Diamant par plasma pulsé ", Numéro d'enregistrement : FR0300254, Date de dépôt : 10/01/2003 (extension Europe, USA, en cours au Japon et au Canada)
    - A. Gicquel, F. Silva, X. Duten, K. Hassouni, G. Lombardi, A. Rousseau, Patent US 7,662,441,B2 (2010).
    - P. Doppelt, A. Tallaire, M. Naamoun, A. Gicquel, F ; Silva, J. Achard, Procédé de traitement de surface pour monocristaux de matériaux, brevet français, 12 août 2012

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